SCI期刊

Materials Science In Semiconductor Processing

所属分类:SCI期刊

Materials Science In Semiconductor Processing期刊基本信息

Materials Science In Semiconductor Processing
期刊简称

MAT SCI SEMICON PROC

期刊ISSN

1369-8001

影响因子

2.722

是否SCI

SCI、SCIE

是否开源

No

出版地

ENGLAND

审稿周期

Bimonthly

创刊年份

1998

研究方向

工程技术

Materials Science In Semiconductor Processing中文介绍

《Materials Science In Semiconductor Processing》是一本由ELSEVIER SCI LTD出版商出版的专业工程技术期刊,该刊创刊于1998年,刊期Bimonthly,该刊已被国际权威数据库SCI、SCIE收录。在中科院最新升级版分区表中,该刊分区信息为大类学科:工程技术 3区,小类学科:工程:电子与电气 3区;材料科学:综合 3区;物理:应用 3区;物理:凝聚态物理 3区;在JCR(Journal Citation Reports)分区等级为Q2。该刊发文范围涵盖工程:电子与电气等领域,旨在及时、准确、全面地报道国内外工程:电子与电气工作者在该领域取得的最新研究成果、工作进展及学术动态、技术革新等,促进学术交流,鼓励学术创新。2021年影响因子为4.644,平均审稿速度约1.7个月。

Materials Science In Semiconductor Processing英文介绍

Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.

Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.

Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.

Materials Science In Semiconductor Processing中科院分区

大类学科 分区 小类学科 分区 Top期刊 综述期刊
工程技术 3区 ENGINEERING, ELECTRICAL & ELECTRONIC 工程:电子与电气 MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科学:综合 PHYSICS, APPLIED 物理:应用 PHYSICS, CONDENSED MATTER 物理:凝聚态物理 3区 3区 3区 3区

Materials Science In Semiconductor Processing期刊近9年JCR分区变化趋势

Materials Science In Semiconductor ProcessingJCR分区(JCR2021-2022年分区)

JCR分区等级 JCR所属学科 分区 影响因子
Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Q2 4.644
PHYSICS, APPLIED Q2
PHYSICS, CONDENSED MATTER Q2
ENGINEERING, ELECTRICAL & ELECTRONIC Q2

Materials Science In Semiconductor Processing期刊近7年影响因子变化趋势

Materials Science In Semiconductor Processing期刊的CiteScore值(CiteScore2021-2022年CiteScore值)

CiteScore SJR SNIP 学科类别 分区 排名 百分位
6.70 0.687 1.062 大类:Engineering 小类:Mechanical Engineering Q1 84 / 601

86%

大类:Engineering 小类:Mechanics of Materials Q1 57 / 384

85%

大类:Engineering 小类:Condensed Matter Physics Q1 68 / 415

83%

大类:Engineering 小类:General Materials Science Q1 100 / 455

78%

Materials Science In Semiconductor Processing期刊近7年自引率变化趋势